Compact

Developing Machine
- ProcessSpray develop
- Best forSmall batches
Bench/standalone unit for plates and panels.
After exposure, the developing machine removes soluble resist with a controlled spray of developer, then rinses and dries. Stable temperature, spray pressure and conveyor speed give consistent, undercut-free patterns across every panel.

Bench/standalone unit for plates and panels.

Continuous develop-rinse-dry for production.

Develop, etch and strip in one conveyor line.
Tell us your resist type and throughput — we'll size the right developing machine or line.