Photochemical Etching Equipment · Since 2003 +86 150 1060 8128 etchmachinery@163.com
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Semiconductor & solar etching equipment

Wet-process lines for silicon wafers, LCD and TCO glass — silicon-chip etching, develop-etch-strip (DES) and precision washing systems built for clean, repeatable results.

GE wet-process semiconductor etching equipment supports solar cell, display and chip manufacturing. From texturing and etching to multi-stage rinsing and drying, each line is engineered for particle control, uniform flow and gentle handling of fragile substrates.

DESDevelop-etch-strip DES line

Develop–Etch–Strip Line

  • ProcessD / E / S inline
  • Best forVolume parts

Three wet stages in one continuous line.

SiliconSilicon chip etching line

Silicon-Chip Etching Line

  • SubstrateWafer
  • Best forTexture / etch

Texturing and etching for solar and chip wafers.

WashingSilicon chip washing line

Silicon Washing Line

  • ProcessMulti-stage rinse
  • Best forWafer cleaning

Particle-controlled rinsing and drying.

LCD glassLCD glass washing line

LCD Glass Washing Line

  • SubstrateDisplay glass
  • Best forPre-process clean

Gentle cleaning for flat-panel glass.

TCO glassTCO glass washing line

TCO Glass Washing Line

  • SubstrateTCO-coated glass
  • Best forThin-film solar

Cleans conductive-oxide coated panels.

WashingSemiconductor washing line

Semiconductor Washing Line

  • ProcessCascade rinse
  • Best forPost-etch clean

Final cleaning before downstream steps.

Configure your wet-process line

Tell us your substrate, throughput and cleanliness target — we'll engineer the right line.