
Develop–Etch–Strip Line
- ProcessD / E / S inline
- Best forVolume parts
Three wet stages in one continuous line.
GE wet-process semiconductor etching equipment supports solar cell, display and chip manufacturing. From texturing and etching to multi-stage rinsing and drying, each line is engineered for particle control, uniform flow and gentle handling of fragile substrates.

Three wet stages in one continuous line.

Texturing and etching for solar and chip wafers.
Particle-controlled rinsing and drying.

Gentle cleaning for flat-panel glass.

Cleans conductive-oxide coated panels.
Final cleaning before downstream steps.
Tell us your substrate, throughput and cleanliness target — we'll engineer the right line.